Vacca, Anthony D.: шукати на сайті Z-Library

Пожертвування 15 вересня 2024 – 1 жовтня 2024 Про збір коштів

Найбільша колекція наукових статей у сіті. 70,000,000+ безкоштовних статей.

Пожертвування 15 вересня 2024 – 1 жовтня 2024

Z-Library - одна з найбільших онлайн-бібліотек у світі, в якій зберігається більше 17,000,000 книг та 84,837,000 статей. Ми намагаємось зробити літературу доступною кожному. Сьогодні (15 вересня 2024) ми відкриваємо додатковий збір пожертвувань на підтримку та розвиток проекту.

Також БЕЗЛІМТНІ завантаження (протягом 31 дня після завершення пожертвування) доступні для ВСІХ користувачів, які підтримають проект в період збору коштів до 1 жовтня 2024.

Про збір коштів Детальніше

Підтримати

Книги
Статті (35)
Найпопулярніші
Перелік
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1

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Automatic classification and defect verification based on inspection technology with lithography simulation

Hayashi, Naoya, Kasprowicz, Bryan S., Kato, Masaya, Inuzuka, Hideki, Kosuge, Takeshi, Yoshikawa, Shingo, Kanno, Kayoko, Imai, Hidemichi, Miyashita, Hiroyuki, Vacca, Anthony, Fiekowsky, Peter, Fiekowsk

Рік:

2015

Мова:

english

Файл:

PDF, 640 KB

english, 2015

2

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Bridging the gaps between mask inspection/review systems and actual wafer printability using computational metrology and inspection (CMI) technologies

Pang, Linyong, Abboud, Frank E., Faure, Thomas B., Tolani, Vikram L., Satake, Masaki, Hu, Peter, Peng, Danping, Liu, Tingyang, Chen, Dongxue, Vacca, Anthony D., Gleason, Bob

Рік:

2012

Мова:

english

Файл:

PDF, 7.71 MB

english, 2012

3

A series of 5-aminosubstituted 4-fluorobenzyl-8-hydroxy-[1,6]naphthyridine-7-carboxamide HIV-1 integrase inhibitors

James P. Guare, John S. Wai, Robert P. Gomez, Neville J. Anthony, Samson M. Jolly, Amanda R. Cortes, Joseph P. Vacca, Peter J. Felock, Kara A. Stillmock, William A. Schleif, Gregory Moyer, Lori J. Gab

Журнал:

Bioorganic & Medicinal Chemistry Letters

Рік:

2006

Мова:

english

Файл:

PDF, 159 KB

english, 2006

4

A top-down perspective on dopamine, motivation and memory

Anthony G. Phillips, Giada Vacca, Soyon Ahn

Журнал:

Pharmacology Biochemistry and Behavior

Рік:

2008

Мова:

english

Файл:

PDF, 1.42 MB

english, 2008

5

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Increasing reticle inspection efficiency and reducing wafer print-checks using automated defect classification and simulation

Ryu, Sung Jae, Lim, Sung Taek, Vacca, Anthony, Fiekowsky, Peter, Fiekowsky, Dan, Faure, Thomas B., Ackmann, Paul W.

Рік:

2013

Мова:

english

Файл:

PDF, 688 KB

english, 2013

6

SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Photomask production integration of KLA STARlight 300 system

Kalk, Franklin D., Mentzer, David, Vacca, Anthony, Shelden, Gilbert V., Wiley, James N.

Рік:

1995

Мова:

english

Файл:

PDF, 1.00 MB

english, 1995

7

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Comprehensive defect detection featuring die-to-database reflected light inspection

Vacca, Anthony, Taylor, Darren, Staud, Wolfgang, Weed, J. Tracy

Рік:

2004

Мова:

english

Файл:

PDF, 712 KB

english, 2004

8

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Improved method for measuring and assessing reticle pinhole defects for the 100-nm lithography node

Taylor, Darren, Vacca, Anthony, Zurbrick, Larry S., Kawahira, Hiroichi

Рік:

2002

Мова:

english

Файл:

PDF, 769 KB

english, 2002

9

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Evaluation of a multiple-beam defect inspection platform using an integrated reference mask

Chen, Jerry X., Kalk, Franklin D., Vacca, Anthony, Pomeroy, Scott, Carroll, Jordan, Grenon, Brian J., Dao, Giang T.

Рік:

2001

Мова:

english

Файл:

PDF, 1.27 MB

english, 2001

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Improving reticle defect disposition via fully automated lithography simulation

Sanchez, Martha I., Ukraintsev, Vladimir A., Mann, Raunak, Goodman, Eliot, Lao, Keith, Ha, Steven, Vacca, Anthony, Fiekowsky, Peter, Fiekowsky, Dan

Рік:

2016

Мова:

english

Файл:

PDF, 1.08 MB

english, 2016

11

Synthesis of the (3 R ,6 S )-3-Amino-6-(2,3-difluorophenyl)azepan-2-one of Telcagepant (MK-0974), a Calcitonin Gene-Related Peptide Receptor Antagonist for the Treatment of Migraine Headache

Burgey, Christopher S., Paone, Daniel V., Shaw, Anthony W., Deng, James Z., Nguyen, Diem N., Potteiger, Craig M., Graham, Samuel L., Vacca, Joseph P., Williams, Theresa M.

Журнал:

Organic Letters

Рік:

2008

Мова:

english

Файл:

PDF, 127 KB

english, 2008

12

A naphthyridine carboxamide provides evidence for discordant resistance between mechanistically identical inhibitors of HIV-1 integrase

Hazuda, D. J., Anthony, N. J., Gomez, R. P., Jolly, S. M., Wai, J. S., Zhuang, L., Fisher, T. E., Embrey, M., Guare, J. P., Egbertson, M. S., Vacca, J. P., Huff, J. R., Felock, P. J., Witmer, M. V., S

Журнал:

Proceedings of the National Academy of Sciences

Рік:

2004

Мова:

english

Файл:

PDF, 427 KB

english, 2004

13

Effects of Short-Term Abstinence from Escalating Doses of D-Amphetamine on Drug and Sucrose-Evoked Dopamine Efflux in the Rat Nucleus Accumbens

Vacca, Giada, Ahn, Soyon, Phillips, Anthony G

Журнал:

Neuropsychopharmacology

Рік:

2007

Мова:

english

Файл:

PDF, 348 KB

english, 2007

14

SPIE Proceedings [SPIE Symposium on Photomask and X-Ray Mask Technology - Kawasaki City, Japan (Thursday 18 April 1996)] Photomask and X-Ray Mask Technology III - Detection and printability of random and programmed pinholes on Cr photomasks

Kalk, Franklin D., Vacca, Anthony, Howard, Charles H., Karklin, Linard, Yoshihara, Hideo

Рік:

1996

Мова:

english

Файл:

PDF, 894 KB

english, 1996

15

Sea Otter Mortality at Kodiak Island, Alaska, during Summer 1987

Anthony R. DeGange and M. Michele Vacca

Журнал:

Journal of Mammalogy

Рік:

1989

Мова:

english

Файл:

PDF, 163 KB

english, 1989

16

Professional Growth of Secondary English Teachers

JoAnne L. Vacca and Anthony L. Manna

Журнал:

English Education

Рік:

1985

Мова:

english

Файл:

PDF, 1.07 MB

english, 1985

17

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Improved method for measuring and assessing reticle pinhole defects

Taylor, Darren, Vacca, Anthony, Zurbrick, Larry S., Howard, William B., Broadbent, William H., Dao, Giang T., Grenon, Brian J.

Рік:

2002

Мова:

english

Файл:

PDF, 433 KB

english, 2002

18

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Inspection of Laser-Written Reticles for the 90 nm Node

Vacca, Anthony, Ahmadian, Mohsen, Chen, Jerry X., Kalk, Franklin D., Grenon, Brian J., Kimmel, Kurt R.

Рік:

2002

Мова:

english

Файл:

PDF, 352 KB

english, 2002

19

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - A new methodology to specify via and contact layer reticles for maximizing process latitude

Strozewski, Kirk J., Perez, Joe, Vacca, Anthony, Klaum, Arthur D., Brankner, Keith J., Herr, Daniel J.

Рік:

2003

Мова:

english

Файл:

PDF, 132 KB

english, 2003

20

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Chromeless phase lithography reticle defect inspection challenges and solutions

Zurbrick, Larry S., Vacca, Anthony, Reese, Byran, Van Den Broeke, Douglas, Hsu, Stephen, Taylor, Darren, Kasprowicz, Bryan, Staud, Wolfgang, Weed, J. Tracy

Рік:

2004

Мова:

english

Файл:

PDF, 280 KB

english, 2004

21

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Model-based mask verification

Foussadier, Frank, Naber, Robert J., Kawahira, Hiroichi, Sundermann, Frank, Vacca, Anthony, Wiley, Jim, Chen, George, Takigawa, Tadahiro, Hayano, Katsuya, Narukawa, Syougo, Kawashima, Satoshi, Mohri,

Рік:

2007

Мова:

english

Файл:

PDF, 632 KB

english, 2007

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Improved reticle requalification accuracy and efficiency via simulation-powered automated defect classification

Cain, Jason P., Sanchez, Martha I., Paracha, Shazad, Eynon, Benjamin, Noyes, Ben F., Nhiev, Anthony, Vacca, Anthony, Fiekowsky, Peter, Fiekowsky, Dan, Ham, Young Mog, Uzzel, Doug, Green, Michael, MacD

Рік:

2014

Мова:

english

Файл:

PDF, 1.24 MB

english, 2014

23

SPIE Proceedings [SPIE 17th Annual BACUS Photomask Technology and Management - Redwood City, CA (Wednesday 17 September 1997)] 17th Annual BACUS Symposium on Photomask Technology and Management - 100-nm defect detection using an existing image acquisition system

Vacca, Anthony, Eynon, Jr., Benjamin G., Yeomans, Steve, Reynolds, James A., Grenon, Brian J.

Рік:

1998

Мова:

english

Файл:

PDF, 888 KB

english, 1998

24

SPIE Proceedings [SPIE 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 15 November 1999)] 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Advanced CD error detection with CD SEM disposition

Taylor, Darren, Rockwell, Barry, Dong, Aihua, Vacca, Anthony, Ng, Waiman, Anderson, Geoffrey T., Howard, William B., Behringer, Uwe F. W.

Рік:

2000

Мова:

english

Файл:

PDF, 3.43 MB

english, 2000

25

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Defect inspection capability for advanced OPC photomasks

Straub, Joseph A., Vacca, Anthony, Zurbrick, Larry S., Grenon, Brian J., Abboud, Frank E.

Рік:

1998

Мова:

english

Файл:

PDF, 2.53 MB

english, 1998

26

SPIE Proceedings [SPIE 16th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 18 September 1996)] 16th Annual BACUS Symposium on Photomask Technology and Management - Pinhole defect detection and printability prediction

Kalk, Franklin D., Vacca, Anthony, Radcliff, Peter, Shelden, Gilbert V., Reynolds, James A.

Рік:

1996

Мова:

english

Файл:

PDF, 1.11 MB

english, 1996

27

SPIE Proceedings [SPIE Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V - Kawasaki City, Japan (Thursday 9 April 1998)] Photomask and X-Ray Mask Technology V - 100-nm defect detection using an existing image acquistion system

Vacca, Anthony, Eynon, Jr., Benjamin G., Yeomans, Steve, Aizaki, Naoaki

Рік:

1998

Мова:

english

Файл:

PDF, 2.45 MB

english, 1998

28

SPIE Proceedings [SPIE 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 15 November 1999)] 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Improving reticle yields with after develop inspection (ADI)

Kalk, Franklin D., Brankner, Keith J., Peters, Laurie, Vacca, Anthony, Pomeroy, Scott, Emery, David, Behringer, Uwe F. W.

Рік:

2000

Мова:

english

Файл:

PDF, 4.52 MB

english, 2000

29

SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - Characterization of inspection sensitivity on advanced OPC reticles

Zurbrick, Larry S., Straub, Joseph A., Vacca, Anthony, Behringer, Uwe F. W.

Рік:

1999

Мова:

english

Файл:

PDF, 1.66 MB

english, 1999

30

SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Characterization of an advanced performance reticle defect inspection algorithm

Wiley, James N., Aquino, Christopher M., Burnham, Douglas V., Vacca, Anthony, Aizaki, Naoaki

Рік:

1997

Мова:

english

Файл:

PDF, 2.37 MB

english, 1997

31

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Techniques to detect and analyze photomask CD uniformity errors

Vacca, Anthony, Ng, Waiman, Anderson, Geoffrey T., Rockwell, Barry, Dong, Aihua, Taylor, Darren, Abboud, Frank E., Grenon, Brian J.

Рік:

1999

Мова:

english

Файл:

PDF, 661 KB

english, 1999

32

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Measuring and assessing printability of reticle pinhole defects

Taylor, Darren, Vacca, Anthony, Zurbrick, Larry S., Broadbent, William H., Fiekowsky, Peter

Рік:

2002

Мова:

english

Файл:

PDF, 1.20 MB

english, 2002

33

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Dry etch yield enhancement by use of after-develop inspection

Kalk, Franklin D., Brankner, Keith J., Peters, Lori, Vacca, Anthony, Pomeroy, Scott, Emery, David, Abboud, Frank E., Grenon, Brian J.

Рік:

1999

Мова:

english

Файл:

PDF, 2.36 MB

english, 1999

34

The stem/progenitor landscape is reshaped in a mouse model of essential thrombocythemia and causes excess megakaryocyte production

Prins, Daniel, Park, Hyun Jung, Watcham, Sam, Li, Juan, Vacca, Michele, Bastos, Hugo P., Gerbaulet, Alexander, Vidal-Puig, Antonio, GÃ¶ttgens, Berthold, Green, Anthony R.

Журнал:

Science Advances

Рік:

2020

Файл:

PDF, 2.17 MB

2020

35

Neural bases for attenuation of morphine withdrawal by Heantos-4: role of l-tetrahydropalmatine

Ahn, Soyon, Nesbit, Maya O., Zou, Haiyan, Vacca, Giada, Axerio-Cilies, Peter, Van Sung, Tran, Phillips, Anthony G.

Журнал:

Scientific Reports

Рік:

2020

Файл:

PDF, 6.06 MB

2020